蒋娜,袁小武,张才勇

• 1:峨嵋半导体材料研究所

摘要(Abstract)：

综述了单晶硅生长技术的研究现状。对改良热场技术、磁场直拉技术、真空高阻技术以及氧浓度的控制等技术进行了论述。

关键词(KeyWords)： 单晶硅;真空高阻;磁场;氧含量;氮掺杂

Abstract:

Keywords:

基金项目(Foundation):

作者(Author): 蒋娜,袁小武,张才勇

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